The laser pulse for plasma radiation is delivered by a CO 2 laser system with pulse capabilities that was developed by TRUMPF – the TRUMPF Laser Amplifier. The high-power laser system is based on CO 2 continuous wave laser technology in a power range of over ten kilowatts. It amplifies a CO 2 laser pulse of just a few watts of average power more than 10,000 times in five amplifier stages, creating tens of kilowatts of average pulse power. The peak pulse power reaches multiple megawatts. TRUMPF components are part of the lithography process from laser beam creation, amplification to their direction to the tin droplets. The combination of a complex technical matter that constantly brings about unique and new solutions, very fast series introduction cycles, and the implementation of specific customer requests creates an exciting field for developers, service engineers, and production workers.