Atomic Layer Deposition (ALD) Market Overview and Introduction

Atomic layer deposition (ALD) was valued at over US$ 723.9 Mn in 2018 and it is anticipated to grow at a 19.49% CAGR from 2019 to 2030.

Atomic layer deposition is a technique by which thin films of different materials are deposited onto any substrate material. During the overall process, numerous chemicals are made to react with the surface of a material with series of steps that creates a thin film. Atomic layer deposition is employed for products such as data storage devices, displays, and small electronic components, where the thickness of the film is absolutely imperative. Atomic layer deposition has a vast array of applications, therefore making it a popular tool for the development of nano-coatings and thin films. Atomic layer deposition (ALD) has displayed great promise in emerging semiconductor and energy conversion technologies.

Rising demand from semiconductor industry is the major factor driving the market growth. ALD is increasingly being used in lithium batteries as it can store large amount of energy in compact size. ALD coatings have emerged to be the novel standard for lithium-ion battery production. The demand for solid state thin film batteries are increasing at remarkable rate owing to the increasing trend of using smart watches, tablets, smart phones and implantable medical devices. Introduction of plasma-enhanced ALD (PEALD) technology is another factor propelling the global ALD market. It helps to enhance the film properties at lower temperature. High cost of ALD is the major factor restraining the market growth. However, to provide products at lower price, key players are focusing extensively on product designing and collaborative association.

Atomic Layer Deposition (ALD) Market by Product

By product type, the market is segmented into aluminum oxide, catalytic, metal, plasma enhanced (PEALD) and other products. Aluminum oxide is the leading segment in the global ALD market. Aluminum oxide based ALD is a convenient method to produce thin film coatings with tailored physical properties, thereby making it a vital product for ALD market. Aluminum oxide film dictates a significant market share in the global ALD market, as it finds wide scale application in silicon solar cells. The ease in availability of aluminum oxide as raw material for ALD technology in the deposition process has significantly contributed to the growing adoption of this product. Plasma-enhanced ALD (PEALD) has emerged out to be the most lucrative segment in the product market. Increasing adoption of plasma-enhanced ALD (PEALD) can be attributed to precise deposition of layers at very low temperatures.

Atomic Layer Deposition (ALD) Market by Applications

ALD is a critical process in the fabrication of different semiconductor devices, and is increasingly being used for the synthesis of nanomaterial. Semiconductor is the leading application of ALD technique, driven by growing demand for innovative electronic products, including smartphones and mobile device. The segment of solar devices is anticipated to grow significantly during the forecast period owing to increasing awareness regarding renewable sources of energy and ability to fabricate stable and efficient solar cells using ALD technologies.

Atomic Layer Deposition (ALD) Market by Region

Based on region, Asia-Pacific is projected to dominate the market over the forecast period owing to rising demand from semiconductor and electronics industry. In addition, rise in adoption of ALD devices for solar devices and healthcare interventions are anticipated to propel the growth of ALD market in the Asia Pacific region.

Atomic Layer Deposition (ALD) Market Prominent Players

The ALD market is dominated by leading players such as ASM International, Tokyo Electron Limited (TEL) and LAM Research Corporation. Other key players of the market such as Veeco Instruments Inc., Picosun Oy, Applied Materials, Inc., AIXTRON, Kurt J. Lesker Company, Denton Vacuum, and ADEKA CORPORATION, among others.